Characterization of deep-level defects and their connection with the performance of InxGa1-xAs/InP p-i-n photodiodes

Tatyana V. Torchinskaya, Volodya I. Kooshnirenko, Ludmila V. Shcherbina, Carla J. Miner

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The parameters of the deep centers in MOCVD In0.53Ga0.47As layers and their dependence on electric field value and device topology on the wafers were studied by DLTS method in In0.53Ga0.47As/InP p-i-n photodiodes. The two deep centers with the activation energy E C -0.299 and 0.389 eV were discovered in depletion region of the p-i-n diodes. The latter defects are nonradiative recombination centers with strong electric field dependence of their activation energies and strong temperature dependence of the capture cross sections.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsAnant G. Sabnis
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages233-236
Number of pages4
ISBN (Print)081941669X
StatePublished - 1994
Externally publishedYes
EventManufacturing Process Control for Microelectronic Devices and Circuits - Austin, TX, USA
Duration: 20 Oct 199421 Oct 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2336
ISSN (Print)0277-786X

Conference

ConferenceManufacturing Process Control for Microelectronic Devices and Circuits
CityAustin, TX, USA
Period20/10/9421/10/94

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