Characterization of deep-level defects and their connection with the performance of InxGa1-xAs/InP p-i-n photodiodes

Tatyana V. Torchinskaya, Volodya I. Kooshnirenko, Ludmila V. Shcherbina, Carla J. Miner

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Resumen

The parameters of the deep centers in MOCVD In0.53Ga0.47As layers and their dependence on electric field value and device topology on the wafers were studied by DLTS method in In0.53Ga0.47As/InP p-i-n photodiodes. The two deep centers with the activation energy E C -0.299 and 0.389 eV were discovered in depletion region of the p-i-n diodes. The latter defects are nonradiative recombination centers with strong electric field dependence of their activation energies and strong temperature dependence of the capture cross sections.

Idioma originalInglés
Título de la publicación alojadaProceedings of SPIE - The International Society for Optical Engineering
EditoresAnant G. Sabnis
EditorialSociety of Photo-Optical Instrumentation Engineers
Páginas233-236
Número de páginas4
ISBN (versión impresa)081941669X
EstadoPublicada - 1994
Publicado de forma externa
EventoManufacturing Process Control for Microelectronic Devices and Circuits - Austin, TX, USA
Duración: 20 oct. 199421 oct. 1994

Serie de la publicación

NombreProceedings of SPIE - The International Society for Optical Engineering
Volumen2336
ISSN (versión impresa)0277-786X

Conferencia

ConferenciaManufacturing Process Control for Microelectronic Devices and Circuits
CiudadAustin, TX, USA
Período20/10/9421/10/94

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Profundice en los temas de investigación de 'Characterization of deep-level defects and their connection with the performance of InxGa1-xAs/InP p-i-n photodiodes'. En conjunto forman una huella única.

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