Structure, morphology, and local photoelectrical characterization of PbS films grown by SILAR

In this work, the structure, morphology, and local electrical properties of lead sulfide films growth by Successive Ionic Layer Adsorption and Reaction was studied. Films were deposited from 100 to 500 cycles onto glass substrates. Film thickness increase from 100 to 800 nm with the number of deposition cycles. The deposited films are single phase, cubic PbS. Raman spectra present a band at 969 cm⁻¹ arising from surface oxidation during deposition, as well as a band at 138 cm⁻¹ related with the growth mode. Films prepared at 100 cycles have a mixed layer-island growth mode, while the films prepared at 200 and 500 cycles have granular morphologies with voids. The local electrical characterization indicates that films electrical and photo response depend on the film morphology.