Structural and optical properties of GaN thin films grown on Al 2 O 3 substrates by MOCVD at different reactor pressures

A. Guillén-Cervantes, Z. Rivera-Álvarez, M. López-López, A. Ponce-Pedraza, C. Guarneros, V. M. Sánchez-Reséndiz

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10 Citas (Scopus)

Resumen

GaN thin films grown by MOCVD on (0 0 0 1) Al 2 O 3 substrates at different growth pressures were characterized by field-emission scanning electron microscopy, atomic force microscopy, micro-Raman, and photoluminescence at room temperature. It was found that there is an optimum pressure of 76 Torr at which the structural and optical properties of the GaN samples are superior. On the other hand samples grown at higher pressure exhibited hexagonal surface pits and surface spirals. The results showed that the growth pressure strongly influences the morphology, and significantly affects the structural and optical properties of the GaN epilayers.

Idioma originalInglés
Páginas (desde-hasta)1267-1271
Número de páginas5
PublicaciónApplied Surface Science
Volumen258
N.º3
DOI
EstadoPublicada - 15 nov. 2011
Publicado de forma externa

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