Structural and electrical characterization of thermally oxidized Zn films

O. García-Serrano, M. Vázquez-Agustín, R. Peña-Sierra, G. Romero-Paredes, O. Goiz-Amaro

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Resumen

High quality ZnO films were obtained by thermal oxidation of Zn films on the temperature range from 300 to 700 °C. Zn films of 190 nm in thickness were deposited on silicon and glass substrates by the sputtering technique. Thermal oxidation was done at normal environment conditions. The complete oxidation of the Zn films was determined by the ZnO films transparency. The ZnO films resulted dense with mirror-like surface. The film structural characterization was realized by X-ray diffraction measurements. The electrical characteristics were measured by the van der Pauw method at room temperature. The ZnO films resulted n-type with carrier concentration of 1016 to 1017cm-3 and mobility values in the range of 1 to 50 cm2/V-s.

Idioma originalInglés
Título de la publicación alojadaProgram and Abstract Book - 2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010
Páginas560-564
Número de páginas5
DOI
EstadoPublicada - 2010
Publicado de forma externa
Evento2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010 - Tuxtla Gutierrez, México
Duración: 8 sep. 201010 sep. 2010

Serie de la publicación

NombreProgram and Abstract Book - 2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010

Conferencia

Conferencia2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010
País/TerritorioMéxico
CiudadTuxtla Gutierrez
Período8/09/1010/09/10

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