Structural and electrical characterization of thermally oxidized Zn films

O. García-Serrano, M. Vázquez-Agustín, R. Peña-Sierra, G. Romero-Paredes, O. Goiz-Amaro

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

High quality ZnO films were obtained by thermal oxidation of Zn films on the temperature range from 300 to 700 °C. Zn films of 190 nm in thickness were deposited on silicon and glass substrates by the sputtering technique. Thermal oxidation was done at normal environment conditions. The complete oxidation of the Zn films was determined by the ZnO films transparency. The ZnO films resulted dense with mirror-like surface. The film structural characterization was realized by X-ray diffraction measurements. The electrical characteristics were measured by the van der Pauw method at room temperature. The ZnO films resulted n-type with carrier concentration of 1016 to 1017cm-3 and mobility values in the range of 1 to 50 cm2/V-s.

Original languageEnglish
Title of host publicationProgram and Abstract Book - 2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010
Pages560-564
Number of pages5
DOIs
StatePublished - 2010
Externally publishedYes
Event2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010 - Tuxtla Gutierrez, Mexico
Duration: 8 Sep 201010 Sep 2010

Publication series

NameProgram and Abstract Book - 2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010

Conference

Conference2010 7th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2010
Country/TerritoryMexico
CityTuxtla Gutierrez
Period8/09/1010/09/10

Keywords

  • Electrical characteristics
  • N-type conductivity
  • Oxide semiconductors
  • Thermal oxidation
  • Thin films
  • ZnO

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