TY - JOUR
T1 - Properties of al2o3 thin films grown by pe-ald at low temperature using h2o and o2 plasma oxidants
AU - Castillo-Saenz, Jhonathan
AU - Nedev, Nicola
AU - Valdez-Salas, Benjamín
AU - Curiel-Alvarez, Mario
AU - Mendivil-Palma, María Isabel
AU - Hernandez-Como, Norberto
AU - Martinez-Puente, Marcelo
AU - Mateos, David
AU - Perez-Landeros, Oscar
AU - Martinez-Guerra, Eduardo
N1 - Publisher Copyright:
© 2021 by the authors. Licensee MDPI, Basel, Switzerland.
PY - 2021/10
Y1 - 2021/10
N2 - Al2O3 layers with thicknesses in the 25–120 nm range were deposited by plasma enhanced atomic layer deposition at 70◦C. Trimethylaluminum was used as organometallic precursor, O2 and H2O as oxidant agents and Ar as a purge gas. The deposition cycle consisted of 50 ms TMA pulse/10 s purge time/6 s of plasma oxidation at 200 W/10 s purge time. The optical constants and thicknesses of the grown layers were determined by spectroscopic ellipsometry, while the roughness was measured by atomic force microscopy, giving RMS values in the 0.29–0.32 nm range for films deposited under different conditions and having different thicknesses. High transmittance, ~90%, was measured by UV–Vis spectroscopy. X-ray photoelectron spectroscopy revealed that, with both types of oxidants, the obtained films are close to stoichiometric composition and, with high purity, no carbon was detected. Electrical characterization showed good insulating properties of both types of films, though the H2O oxidant leads to better I-V characteristics.
AB - Al2O3 layers with thicknesses in the 25–120 nm range were deposited by plasma enhanced atomic layer deposition at 70◦C. Trimethylaluminum was used as organometallic precursor, O2 and H2O as oxidant agents and Ar as a purge gas. The deposition cycle consisted of 50 ms TMA pulse/10 s purge time/6 s of plasma oxidation at 200 W/10 s purge time. The optical constants and thicknesses of the grown layers were determined by spectroscopic ellipsometry, while the roughness was measured by atomic force microscopy, giving RMS values in the 0.29–0.32 nm range for films deposited under different conditions and having different thicknesses. High transmittance, ~90%, was measured by UV–Vis spectroscopy. X-ray photoelectron spectroscopy revealed that, with both types of oxidants, the obtained films are close to stoichiometric composition and, with high purity, no carbon was detected. Electrical characterization showed good insulating properties of both types of films, though the H2O oxidant leads to better I-V characteristics.
KW - AlO thin films
KW - Low temperature
KW - PE-ALD
UR - http://www.scopus.com/inward/record.url?scp=85118335200&partnerID=8YFLogxK
U2 - 10.3390/coatings11101266
DO - 10.3390/coatings11101266
M3 - Artículo
AN - SCOPUS:85118335200
SN - 2079-6412
VL - 11
JO - Coatings
JF - Coatings
IS - 10
M1 - 1266
ER -