Photoacoustic thermal characterization of spark-processed porous silicon

A. Cruz-Orea, I. Delgadilllo, H. Vargas, A. Gudiño-Martínez, E. Marín, C. Vázquez-López, A. Calderón, J. J. Alvarado-Gil

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

26 Citas (Scopus)

Resumen

A non-separation approach to determine the spark-processed porous silicon thermal parameters is presented. This thermal characterization was performed through application of the photoacoustic technique, in combination with compositional models for spark-processed porous silicon samples. The thermal parameters obtained are in agreement with existing studies about the composition of this material. This approach opens the possibility of performing the thermal characterization of other porous semiconductors and analogous materials.

Idioma originalInglés
Páginas (desde-hasta)8951-8954
Número de páginas4
PublicaciónJournal of Applied Physics
Volumen79
N.º12
DOI
EstadoPublicada - 15 jun. 1996
Publicado de forma externa

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