PDMS based negative photoresist for microfluidic applications

Samuel Suhard; Gustavo Ardila; Dominique Collin; Marie Françoise Guimon; Adrian Martinez Rivas; Philippe Martinoty; Monique Mauzac; Anne Françoise Mingotaud; Carole Rossi; Childérick Séverac

PDMS based negative photoresist for microfluidic applications

Samuel Suhard, Gustavo Ardila, Dominique Collin, Marie Françoise Guimon, Adrian Martinez Rivas, Philippe Martinoty, Monique Mauzac, Anne Françoise Mingotaud, Carole Rossi, Childérick Séverac

Producción científica: Contribución a una conferencia › Artículo › revisión exhaustiva

Resumen

We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

Idioma original	Inglés
Páginas	1570-1572
Número de páginas	3
Estado	Publicada - 2008
Publicado de forma externa	Sí
Evento	12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008 - San Diego, CA, Estados Unidos Duración: 12 oct. 2008 → 16 oct. 2008

Conferencia

Conferencia	12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008
País/Territorio	Estados Unidos
Ciudad	San Diego, CA
Período	12/10/08 → 16/10/08

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Suhard, S., Ardila, G., Collin, D., Guimon, M. F., Rivas, A. M., Martinoty, P., Mauzac, M., Mingotaud, A. F., Rossi, C., & Séverac, C. (2008). PDMS based negative photoresist for microfluidic applications. 1570-1572. Papel presentado en 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008, San Diego, CA, Estados Unidos.

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title = "PDMS based negative photoresist for microfluidic applications",

abstract = "We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.",

keywords = "Actuator, PDMS, Photolithography",

author = "Samuel Suhard and Gustavo Ardila and Dominique Collin and Guimon, {Marie Fran{\c c}oise} and Rivas, {Adrian Martinez} and Philippe Martinoty and Monique Mauzac and Mingotaud, {Anne Fran{\c c}oise} and Carole Rossi and Child{\'e}rick S{\'e}verac",

year = "2008",

language = "Ingl{\'e}s",

pages = "1570--1572",

note = "12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008 ; Conference date: 12-10-2008 Through 16-10-2008",

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Suhard, S, Ardila, G, Collin, D, Guimon, MF, Rivas, AM, Martinoty, P, Mauzac, M, Mingotaud, AF, Rossi, C & Séverac, C 2008, 'PDMS based negative photoresist for microfluidic applications', Papel presentado en 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008, San Diego, CA, Estados Unidos, 12/10/08 - 16/10/08 pp. 1570-1572.

PDMS based negative photoresist for microfluidic applications. / Suhard, Samuel; Ardila, Gustavo; Collin, Dominique et al.
2008. 1570-1572 Papel presentado en 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008, San Diego, CA, Estados Unidos.

Producción científica: Contribución a una conferencia › Artículo › revisión exhaustiva

TY - CONF

T1 - PDMS based negative photoresist for microfluidic applications

AU - Suhard, Samuel

AU - Ardila, Gustavo

AU - Collin, Dominique

AU - Guimon, Marie Françoise

AU - Rivas, Adrian Martinez

AU - Martinoty, Philippe

AU - Mauzac, Monique

AU - Mingotaud, Anne Françoise

AU - Rossi, Carole

AU - Séverac, Childérick

PY - 2008

Y1 - 2008

N2 - We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

AB - We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

KW - Actuator

KW - PDMS

KW - Photolithography

UR - http://www.scopus.com/inward/record.url?scp=84902436212&partnerID=8YFLogxK

M3 - Artículo

AN - SCOPUS:84902436212

SP - 1570

EP - 1572

T2 - 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008

Y2 - 12 October 2008 through 16 October 2008

ER -

PDMS based negative photoresist for microfluidic applications

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