PDMS based negative photoresist for microfluidic applications

Samuel Suhard; Gustavo Ardila; Dominique Collin; Marie Françoise Guimon; Adrian Martinez Rivas; Philippe Martinoty; Monique Mauzac; Anne Françoise Mingotaud; Carole Rossi; Childérick Séverac

PDMS based negative photoresist for microfluidic applications

Samuel Suhard, Gustavo Ardila, Dominique Collin, Marie Françoise Guimon, Adrian Martinez Rivas, Philippe Martinoty, Monique Mauzac, Anne Françoise Mingotaud, Carole Rossi, Childérick Séverac

Research output: Contribution to conference › Paper › peer-review

Abstract

We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

Original language	English
Pages	1570-1572
Number of pages	3
State	Published - 2008
Externally published	Yes
Event	12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008 - San Diego, CA, United States Duration: 12 Oct 2008 → 16 Oct 2008

Conference

Conference	12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008
Country/Territory	United States
City	San Diego, CA
Period	12/10/08 → 16/10/08

Keywords

Actuator
PDMS
Photolithography

Cite this

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title = "PDMS based negative photoresist for microfluidic applications",

abstract = "We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.",

keywords = "Actuator, PDMS, Photolithography",

author = "Samuel Suhard and Gustavo Ardila and Dominique Collin and Guimon, {Marie Fran{\c c}oise} and Rivas, {Adrian Martinez} and Philippe Martinoty and Monique Mauzac and Mingotaud, {Anne Fran{\c c}oise} and Carole Rossi and Child{\'e}rick S{\'e}verac",

year = "2008",

language = "Ingl{\'e}s",

pages = "1570--1572",

note = "12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008 ; Conference date: 12-10-2008 Through 16-10-2008",

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Suhard, S, Ardila, G, Collin, D, Guimon, MF, Rivas, AM, Martinoty, P, Mauzac, M, Mingotaud, AF, Rossi, C & Séverac, C 2008, 'PDMS based negative photoresist for microfluidic applications', Paper presented at 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008, San Diego, CA, United States, 12/10/08 - 16/10/08 pp. 1570-1572.

TY - CONF

T1 - PDMS based negative photoresist for microfluidic applications

AU - Suhard, Samuel

AU - Ardila, Gustavo

AU - Collin, Dominique

AU - Guimon, Marie Françoise

AU - Rivas, Adrian Martinez

AU - Martinoty, Philippe

AU - Mauzac, Monique

AU - Mingotaud, Anne Françoise

AU - Rossi, Carole

AU - Séverac, Childérick

PY - 2008

Y1 - 2008

N2 - We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

AB - We report on the development of a simple formulation of polydimethylsiloxane (PDMS) based material used as negative photo resist for microsystems and microfluidic applications. The method to covalently link PDMS to silicon wafers is detailed together with the lithographic process and the mechanical properties after cross-linking.

KW - Actuator

KW - PDMS

KW - Photolithography

UR - http://www.scopus.com/inward/record.url?scp=84902436212&partnerID=8YFLogxK

M3 - Artículo

AN - SCOPUS:84902436212

SP - 1570

EP - 1572

T2 - 12th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2008

Y2 - 12 October 2008 through 16 October 2008

ER -

PDMS based negative photoresist for microfluidic applications

Abstract

Conference

Keywords

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