On the doping problem of CdTe films: The bismuth case

O. Vigil-Galán, M. Brown, C. M. Ruiz, M. A. Vidal-Borbolla, R. Ramírez-Bon, E. Sánchez-Meza, M. Tufiño-Velázquez, M. Estela Calixto, A. D. Compaan, G. Contreras-Puente

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

5 Citas (Scopus)

Resumen

The controlled increase of hole concentration is an important issue and still an unsolved problem for polycrystalline CdTe-based solar cells. The typical hole concentration of as-grown CdTe thin-films goes up to 1013 cm- 3, depending on the specific growth technique. The highest electron concentration obtained for CdS, the suitable window partner material of CdTe, is around 1015 cm- 3. Thus, the PV-performance of a CdS/CdTe device can be optimized if the hole concentration in CdTe is increased. We have faced up this problem by studying the electrical properties of two types of CdTe films: CdTe films grown by Close Space Vapor Transport using a CdTe:Bi powder as the starting material and CdTe sputtered films doped by implantation with different Bi-doses. Temperature-dependent resistivity and Hall effect measurements and a discussion on the efficiency of both doping processes are presented.

Idioma originalInglés
Páginas (desde-hasta)7013-7015
Número de páginas3
PublicaciónThin Solid Films
Volumen516
N.º20
DOI
EstadoPublicada - 30 ago. 2008

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