TY - JOUR
T1 - Numerical model to describe the growth of the internal oxidation layer in binary alloys
AU - Plascencia, Gabriel
AU - Utigard, Torstein A.
AU - Gutiérrez, Juliana
AU - Jaramillo, David
AU - Martínez, Fernando
PY - 2006
Y1 - 2006
N2 - Several analytical models have been developed through the years to describe the formation and growth of the internal oxidation layer in binary alloys. Such models are often complex and their validity strongly rely on precise measurements of molar fluxes of the different species involved in the oxidation process. The main disadvantage of such measurements is that they are difficult to made and present a high degree of uncertainties, thus some assumptions are needed to ease understanding and the applicability of them. In this paper we set up a numerical scheme (finite differences) to describe the growth of the internal oxidation layer in binary Cu-Al alloys oxidized in air at different temperatures. There is good agreement between the experimental results and the values calculated with the aid of our numerical approach.
AB - Several analytical models have been developed through the years to describe the formation and growth of the internal oxidation layer in binary alloys. Such models are often complex and their validity strongly rely on precise measurements of molar fluxes of the different species involved in the oxidation process. The main disadvantage of such measurements is that they are difficult to made and present a high degree of uncertainties, thus some assumptions are needed to ease understanding and the applicability of them. In this paper we set up a numerical scheme (finite differences) to describe the growth of the internal oxidation layer in binary Cu-Al alloys oxidized in air at different temperatures. There is good agreement between the experimental results and the values calculated with the aid of our numerical approach.
KW - Binary alloys
KW - Diffusion
KW - Finite differences method
KW - High temperature oxidation
KW - Internal oxidation layer
UR - http://www.scopus.com/inward/record.url?scp=33847277039&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/ddf.258-260.282
DO - 10.4028/www.scientific.net/ddf.258-260.282
M3 - Artículo
AN - SCOPUS:33847277039
SN - 1012-0386
VL - 258-260
SP - 282
EP - 287
JO - Defect and Diffusion Forum
JF - Defect and Diffusion Forum
ER -