Numerical model to describe the growth of the internal oxidation layer in binary alloys

Gabriel Plascencia, Torstein A. Utigard, Juliana Gutiérrez, David Jaramillo, Fernando Martínez

Research output: Contribution to journalArticlepeer-review

Abstract

Several analytical models have been developed through the years to describe the formation and growth of the internal oxidation layer in binary alloys. Such models are often complex and their validity strongly rely on precise measurements of molar fluxes of the different species involved in the oxidation process. The main disadvantage of such measurements is that they are difficult to made and present a high degree of uncertainties, thus some assumptions are needed to ease understanding and the applicability of them. In this paper we set up a numerical scheme (finite differences) to describe the growth of the internal oxidation layer in binary Cu-Al alloys oxidized in air at different temperatures. There is good agreement between the experimental results and the values calculated with the aid of our numerical approach.

Original languageEnglish
Pages (from-to)282-287
Number of pages6
JournalDefect and Diffusion Forum
Volume258-260
DOIs
StatePublished - 2006

Keywords

  • Binary alloys
  • Diffusion
  • Finite differences method
  • High temperature oxidation
  • Internal oxidation layer

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