Mathematical model of Boltzmann's sigmoidal equation applicable to the set-up of the RF-magnetron co-sputtering in thin films deposition of BaxSr1-xTiO3

J. Reséndiz-Muñoz, M. A. Corona-Rivera, J. L. Fernández-Muñoz, M. Zapata-Torres, A. Márquez-Herrera, V. M. Ovando-Medina

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17 Citas (Scopus)

Resumen

In this work, we present the stoichiometric behaviour of Ba2+ and Sr2+ when they are deposited to make a solid solution of barium strontium titanate. BaxSr1-xTiO3 (BST) thin films of nanometric order on a quartz substrate were obtained by means of in-situ RF-magnetron co-sputtering at 495°C temperature, applying a total power of 120 W divided into intervals of 15 W that was distributed between two magnetron sputtering cathodes containing targets of BaTiO3 and SrTiO3, as follows: 0-120, 15-105, 30-90, 45-75, 60-60, 75-45, 90-30, 105-15 and 120-0 W. Boltzmann's sigmoidal modified equation (Boltzmann's profile) is proposed to explain the behaviour and the deposition ratio Ba/Sr of the BST as a function of the RF-magnetron power. The Boltzmann's profile proposal shows concordance with experimental data of deposits of BST on substrates of nichrome under the same experimental conditions, showing differences in the ratio Ba/Sr of the BST due to the influence of the substrate.

Idioma originalInglés
Páginas (desde-hasta)1043-1047
Número de páginas5
PublicaciónBulletin of Materials Science
Volumen40
N.º5
DOI
EstadoPublicada - sep. 2017

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