Impact of Ga and In co-doping on morphology, structure, and emission of ZnO nanocrystal films

Brahim El Filali, Tetyana Torchynska, Georgiy Polupan, José Alberto Andraca Adame, Jorge Luis Ramirez Garcia

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Resumen

The influence of Ga and In co-doping on morphology, crystal structure, photoluminescence (PL), and electrical resistivity has been studied in ZnO:Ga:In nanocrystal (NC) films. The films were deposited by ultrasonic spray pyrolysis on silicon substrates heated to 400 °C. A set of samples was prepared, where the In content was 1 at.%, but the Ga contents were varied in the range of 0.5–2.5 at.%. All films were annealed at 400 °C for 4 h in a nitrogen flow. ZnO:Ga:In NC films are characterized by the wurtzite crystal structures for all Ga concentrations. Non-monotonic variations in morphology, crystal lattice parameters, and the intensity of near band edge (NBE) emission have been detected in the films versus Ga contents. High-quality NC films with the wurtzite crystal structure, planar morphology, bright NBE emission, and the small intensity of defect related PL bands have been obtained for the 1.5 at.% Ga in the films. The reasons for the non-monotonic variation of the emission and structural parameters with Ga contents have been analyzed and discussed. Graphical abstract: [Figure not available: see fulltext.].

Idioma originalInglés
Páginas (desde-hasta)928-931
Número de páginas4
PublicaciónMRS Advances
Volumen6
N.º41-42
DOI
EstadoPublicada - dic. 2021

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