TY - JOUR
T1 - Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium
AU - Vargas Garcia, J. R.
AU - Goto, Takashi
PY - 2003/9
Y1 - 2003/9
N2 - This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.
AB - This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.
KW - Chemical vapor deposition
KW - Metal organic complex
KW - Noble metals
KW - Platinum group metals
UR - http://www.scopus.com/inward/record.url?scp=0242413108&partnerID=8YFLogxK
U2 - 10.2320/matertrans.44.1717
DO - 10.2320/matertrans.44.1717
M3 - Artículo de revisión
SN - 1345-9678
VL - 44
SP - 1717
EP - 1728
JO - Materials Transactions
JF - Materials Transactions
IS - 9
ER -