Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

J. R. Vargas Garcia, Takashi Goto

Research output: Contribution to journalScientific review

98 Citations (Scopus)

Abstract

This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.
Original languageAmerican English
Pages (from-to)1717-1728
Number of pages1544
JournalMaterials Transactions
StatePublished - 1 Sep 2003
Externally publishedYes

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Iridium
Rhodium
Palladium
iridium
Platinum
rhodium
palladium
Chemical vapor deposition
platinum
Metals
vapor deposition
metals
Deposition rates
Impurities
impurities

Cite this

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Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium. / Vargas Garcia, J. R.; Goto, Takashi.

In: Materials Transactions, 01.09.2003, p. 1717-1728.

Research output: Contribution to journalScientific review

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