CdS and CdTe large area thin films processed by radio-frequency planar-magnetron sputtering

H. Hernández-Contreras, G. Contreras-Puente, J. Aguilar-Hernández, A. Morales-Acevedo, J. Vidal-Larramendi, O. Vigil-Galán

Resultado de la investigación: Contribución a una conferenciaArtículo

19 Citas (Scopus)

Resumen

We present in this work the processing of large area CdS and CdTe thin films. We have been working for this purpose with a Radio-Frequency Planar Magnetron Sputtering (RF-PMS) system with two 6-inch balanced guns, processing thin films in areas as large as 450 cm2 grown on soda-lime glasses. Conducting glasses (SnO2 of 7 Ω/□) were also used only for CdS deposition in order to further analyze the heterojunction CdS/CdTe. The best films have been processed with substrate temperatures (Ts) of 250°C for CdS and 215°C for CdTe; Ar chamber-pressure of 20 mtorr, radio frequency power of 300 W, and different deposition time between target materials. © 2002 Elsevier Science B.V. All rights resreved.
Idioma originalInglés estadounidense
Páginas148-152
Número de páginas132
DOI
EstadoPublicada - 1 feb 2002
EventoThin Solid Films -
Duración: 22 mar 2004 → …

Conferencia

ConferenciaThin Solid Films
Período22/03/04 → …

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