TY - JOUR
T1 - AC bipolar pulsed power supply for reactive magnetron sputtering
AU - García-García, J.
AU - Pacheco-Sotelo, J.
AU - Valdivia-Barrientos, R.
AU - Rivera-Rodríguez, Carlos
AU - Pacheco-Pacheco, M.
AU - Gonzalez, Jean Jacques
AU - Nieto-Pérez, M.
PY - 2011/10
Y1 - 2011/10
N2 - This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.
AB - This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.
KW - Flexible substrate
KW - high rate deposition
KW - thick film
KW - transparent conductive oxide (TCO)
UR - http://www.scopus.com/inward/record.url?scp=80054061006&partnerID=8YFLogxK
U2 - 10.1109/TPS.2011.2162592
DO - 10.1109/TPS.2011.2162592
M3 - Artículo
AN - SCOPUS:80054061006
SN - 0093-3813
VL - 39
SP - 1983
EP - 1989
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 10
M1 - 6004836
ER -