A comparative analysis of synthesizing Gallium Nitride films: On Gallium Arsenide and Sapphire substrates

C. Guarneros, H. Vilchis, V. M. Sánchez, A. Escobosa

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

Resumen

The characteristics of gallium nitride (GaN) films growth on gallium arsenide (GaAs) and sapphire (Al 2O 3) by Metal-organic vapor phase epitaxy (MOVPE) system are presented. Comparing the results we can saw the advantages and disadvantages of use one or other substrate in order to And the best experimental conditions for obtain c-GaN films with good properties.

Idioma originalInglés
Título de la publicación alojada2008 5th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2008
Páginas478-480
Número de páginas3
DOI
EstadoPublicada - 2008
Publicado de forma externa
Evento2008 5th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2008 - Mexico City, México
Duración: 12 nov. 200814 nov. 2008

Serie de la publicación

Nombre2008 5th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2008

Conferencia

Conferencia2008 5th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2008
País/TerritorioMéxico
CiudadMexico City
Período12/11/0814/11/08

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