Ingeniería y ciencia de los materiales
Amorphous carbon
6%
Annealing
6%
Atomic force microscopy
6%
Band structure
6%
Bismuth
5%
Cadmium
15%
Cadmium sulfide
19%
Cadmium telluride
6%
Carbon films
6%
Characterization (materials science)
5%
Crystalline materials
10%
Defects
8%
Energy dispersive spectroscopy
5%
Energy gap
17%
Excitons
10%
Gallium nitride
16%
Glass
7%
Laser ablation
12%
Luminescence
12%
Magnetron sputtering
8%
Molecular beam epitaxy
5%
Nanocrystals
6%
Optical properties
27%
Oxide films
10%
Passivation
6%
Phonons
12%
Photoluminescence
100%
Photoluminescence spectroscopy
9%
Physical properties
11%
Plasma enhanced chemical vapor deposition
6%
Polypyrroles
9%
Pulsed laser deposition
9%
Raman scattering
8%
Raman spectroscopy
14%
Scanning electron microscopy
8%
Secondary ion mass spectrometry
6%
Semiconductor materials
8%
Silicon
13%
Silicon nitride
5%
Silicon oxides
10%
Solar cells
33%
Spray pyrolysis
7%
Sputtering
11%
Structural properties
17%
Substrates
20%
Temperature
19%
Thin films
66%
Thioureas
6%
Vapors
20%
X ray diffraction
11%
Química
Ambient Reaction Temperature
9%
Amorphous Material
10%
Annealing
7%
Band Gap
11%
Bound Exciton
7%
Cadmium Selenide
6%
Cadmium Sulfide
5%
Chalcopyrite
7%
Chemical Passivation
6%
Deposition Technique
7%
Energy
5%
Hexagonal Space Group
6%
Laser Ablation
5%
Liquid Film
40%
LO Phonon
5%
Luminiscence Type
9%
Nitride
14%
Optical Property
15%
Phonon
5%
Photoluminescence
46%
Photoluminescence Spectroscopy
6%
Photoluminescence Spectrum
16%
Plasma Enhanced Chemical Vapour Deposition
5%
Polycrystalline Film
6%
Polycrystalline Solid
8%
Polypyrrole
6%
Pulsed Laser Deposition
7%
Raman Spectroscopy
6%
Silicon Oxide
11%
Solar Cell
23%
Spray Pyrolysis
5%
Sputtering
8%
Surface Recombination
6%
X-Ray Diffraction
5%
Física y astronomía
annealing
6%
baths
14%
cadmium
5%
cadmium selenides
7%
cadmium sulfides
5%
characterization
7%
gallium nitrides
7%
magnetron sputtering
5%
nanoparticles
5%
optical properties
11%
oxide films
9%
passivity
5%
photoluminescence
40%
physical properties
5%
polypyrroles
13%
pulsed laser deposition
5%
radio frequencies
5%
room temperature
6%
silicon
8%
silicon nitrides
6%
silicon oxides
10%
solar cells
9%
temperature
6%
temperature dependence
5%
thin films
24%
vapor deposition
5%
vapors
9%
x rays
5%