Ingeniería y ciencia de los materiales
Photoluminescence
100%
Thin films
66%
Solar cells
33%
Optical properties
27%
Substrates
20%
Vapors
20%
Cadmium sulfide
19%
Temperature
19%
Energy gap
17%
Structural properties
17%
Gallium nitride
16%
Cadmium
15%
Raman spectroscopy
14%
Silicon
13%
Laser ablation
12%
Phonons
12%
Luminescence
12%
Physical properties
11%
X ray diffraction
11%
Sputtering
11%
Excitons
10%
Silicon oxides
10%
Oxide films
10%
Crystalline materials
10%
Photoluminescence spectroscopy
9%
Pulsed laser deposition
9%
Polypyrroles
9%
Magnetron sputtering
8%
Raman scattering
8%
Scanning electron microscopy
8%
Semiconductor materials
8%
Defects
8%
Glass
7%
Spray pyrolysis
7%
Thioureas
6%
Annealing
6%
Atomic force microscopy
6%
Cadmium telluride
6%
Band structure
6%
Carbon films
6%
Plasma enhanced chemical vapor deposition
6%
Amorphous carbon
6%
Passivation
6%
Secondary ion mass spectrometry
6%
Nanocrystals
6%
Energy dispersive spectroscopy
5%
Characterization (materials science)
5%
Molecular beam epitaxy
5%
Silicon nitride
5%
Bismuth
5%
Química
Photoluminescence
46%
Liquid Film
40%
Solar Cell
23%
Photoluminescence Spectrum
16%
Optical Property
15%
Nitride
14%
Silicon Oxide
11%
Band Gap
11%
Amorphous Material
10%
Ambient Reaction Temperature
9%
Luminiscence Type
9%
Polycrystalline Solid
8%
Sputtering
8%
Pulsed Laser Deposition
7%
Bound Exciton
7%
Deposition Technique
7%
Chalcopyrite
7%
Annealing
7%
Polypyrrole
6%
Raman Spectroscopy
6%
Polycrystalline Film
6%
Hexagonal Space Group
6%
Surface Recombination
6%
Photoluminescence Spectroscopy
6%
Cadmium Selenide
6%
Chemical Passivation
6%
Cadmium Sulfide
5%
Plasma Enhanced Chemical Vapour Deposition
5%
LO Phonon
5%
Spray Pyrolysis
5%
Phonon
5%
Energy
5%
X-Ray Diffraction
5%
Laser Ablation
5%
Física y astronomía
photoluminescence
40%
thin films
24%
baths
14%
polypyrroles
13%
optical properties
11%
silicon oxides
10%
oxide films
9%
vapors
9%
solar cells
9%
silicon
8%
cadmium selenides
7%
characterization
7%
gallium nitrides
7%
silicon nitrides
6%
temperature
6%
room temperature
6%
annealing
6%
pulsed laser deposition
5%
radio frequencies
5%
vapor deposition
5%
x rays
5%
cadmium
5%
nanoparticles
5%
passivity
5%
physical properties
5%
magnetron sputtering
5%
temperature dependence
5%
cadmium sulfides
5%