The effect of Si-substrate on the optical characterization of Ge nanostructures obtained by LPCVD

S. N.M. Mestanza, E. Rodriguez, I. Doi, A. R. Vaz, N. C. Frateschi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Germanium nanostructures (Ge-ns) were grown by Low Pressure Chemical Vapor Deposition on a SiO2 film. Samples were studied by micro-Raman spectroscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM). We report the analysis of the influence of the silicon substrate on the Raman scattering spectra of the Ge-ns. Both the broadening and the small shift observed in the Raman peak can be attributed to the variation in the size distribution of the Ge-ns and the phonon confinement. AFM images show a Ge-ns density around 4×1010 cm-2, with a 20 nm mean size and 6 nm height. AFM and SEM images revealed an excellent agreement which could be used to estimate the size and size distribution of the nanostructures. Finally, the Raman spectra were fitted with a theoretical model to evaluate the average size and full-width at half-maximum.

Original languageEnglish
Title of host publicationECS Transactions - 22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
Pages143-149
Number of pages7
Edition1
DOIs
StatePublished - 2007
Externally publishedYes
Event22nd Symposium on Microelectronics Technology and Devices, SBMicro2007 - Rio de Janeiro, Brazil
Duration: 3 Sep 20076 Sep 2007

Publication series

NameECS Transactions
Number1
Volume9
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
Country/TerritoryBrazil
CityRio de Janeiro
Period3/09/076/09/07

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