Pressure induced directional transformations on close spaced vapor transport deposited SnS thin films

Jacob A. Andrade-Arvizu, M. F. García-Sánchez, M. Courel-Piedrahita, J. Santoyo-Morales, D. Jiménez-Olarte, M. Albor-Aguilera, O. Vigil-Galán

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

In this work, SnS thin films were deposited by employing the Close Spaced Vapor Transport (CSVT) technique under air atmosphere. Single-phase, p-type SnS thin films were synthesized by varying the final pressure in the chamber and its effect on the properties of SnS were studied. The pressure impact on the directional preferred orientation (DPO) of grains is presented for the first time. The analysis of different pressure values on deposited film properties was performed by X-ray diffraction analysis, Raman spectroscopy, scanning electron microscopy, atomic force microscopy, optical measurements and electric characterization techniques.

Original languageEnglish
Pages (from-to)878-887
Number of pages10
JournalMaterials and Design
Volume110
DOIs
StatePublished - 15 Nov 2016

Keywords

  • CSVT
  • Chamber pressure variations
  • Physical properties
  • SnS thin films

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