Pressure induced directional transformations on close spaced vapor transport deposited SnS thin films

Jacob A. Andrade-Arvizu, M. F. García-Sánchez, M. Courel-Piedrahita, J. Santoyo-Morales, D. Jiménez-Olarte, M. Albor-Aguilera, O. Vigil-Galán

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

20 Citas (Scopus)

Resumen

In this work, SnS thin films were deposited by employing the Close Spaced Vapor Transport (CSVT) technique under air atmosphere. Single-phase, p-type SnS thin films were synthesized by varying the final pressure in the chamber and its effect on the properties of SnS were studied. The pressure impact on the directional preferred orientation (DPO) of grains is presented for the first time. The analysis of different pressure values on deposited film properties was performed by X-ray diffraction analysis, Raman spectroscopy, scanning electron microscopy, atomic force microscopy, optical measurements and electric characterization techniques.

Idioma originalInglés
Páginas (desde-hasta)878-887
Número de páginas10
PublicaciónMaterials and Design
Volumen110
DOI
EstadoPublicada - 15 nov. 2016

Huella

Profundice en los temas de investigación de 'Pressure induced directional transformations on close spaced vapor transport deposited SnS thin films'. En conjunto forman una huella única.

Citar esto