Parasitic electrostatic capacitances in Si/SiGe n-HFET

N. Zerounian, M. Enciso-Aguilar, T. Hackbarth, H. J. Herzog, F. Aniel

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The influence of parasitic capacitance on high frequency performances of SiGe n-HFET is reported. These capacitances due to fringe effect and electrostatic contribution of the gate are extracted from HF measurement and estimated with a 2D hydrodynamic modeling of the device and with a 2D electrostatic modeling of the HFET. These capacitances lower the intrinsic transit frequency in between 30-38% for the samples reported here. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationSiGe and Ge
Subtitle of host publicationMaterials, Processing, and Devices
PublisherElectrochemical Society Inc.
Pages989-999
Number of pages11
Edition7
ISBN (Electronic)1566775078
DOIs
StatePublished - 2006
EventSiGe and Ge: Materials, Processing, and Devices - 210th Electrochemical Society Meeting - Cancun, Mexico
Duration: 29 Oct 20063 Nov 2006

Publication series

NameECS Transactions
Number7
Volume3
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceSiGe and Ge: Materials, Processing, and Devices - 210th Electrochemical Society Meeting
Country/TerritoryMexico
CityCancun
Period29/10/063/11/06

Fingerprint

Dive into the research topics of 'Parasitic electrostatic capacitances in Si/SiGe n-HFET'. Together they form a unique fingerprint.

Cite this