Nanoelectronic properties of Si and Ge: A semi-empirical approximation

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Abstract

A semi-empirical nearest-neighbor tight-binding approach, that reproduces the indirect band gaps of Si and Ge crystalline, has been applied to study the electronic band dispersion relation of Si and Ge nanowires (NWs). The NWs are modeling by free standing, infinitely long and homogeneous NWs cross sections with the wire axis along the zaxis. The calculations show that Si NWs keeps the indirect bandgap while Ge NWs changes into the direct bandgap when the wire cross-section becomes smaller. Also, the band gap enhancement of Si NWs showing to quantum confinement effects is generally larger than that of similarsized Ge NWs, confirming the larger quantum confinement effects in Si than in Ge when they are confined in two dimensions.

Original languageEnglish
Title of host publication2009 52nd IEEE International Midwest Symposium on Circuits and Systems, MWSCAS '09
Pages859-863
Number of pages5
DOIs
StatePublished - 2009
Event2009 52nd IEEE International Midwest Symposium on Circuits and Systems, MWSCAS '09 - Cancun, Mexico
Duration: 2 Aug 20095 Aug 2009

Publication series

NameMidwest Symposium on Circuits and Systems
ISSN (Print)1548-3746

Conference

Conference2009 52nd IEEE International Midwest Symposium on Circuits and Systems, MWSCAS '09
Country/TerritoryMexico
CityCancun
Period2/08/095/08/09

Keywords

  • Nanowires
  • Silicon germanium
  • Tight-binding

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