Low temperature crystallization of sputtered carbon films

J. M. Yañez-Limón; F. Ruiz; J. González-Hernández; B. S. Chao; S. R. Ovshinsky

doi:10.1063/1.360051

Low temperature crystallization of sputtered carbon films

J. M. Yañez-Limón, F. Ruiz, J. González-Hernández, B. S. Chao, S. R. Ovshinsky

Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada (CICATA), Unidad Legaria

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides.

Original language	English
Pages (from-to)	3015-3019
Number of pages	5
Journal	Journal of Applied Physics
Volume	78
Issue number	5
DOIs	https://doi.org/10.1063/1.360051
State	Published - 1995

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title = "Low temperature crystallization of sputtered carbon films",

abstract = "The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides.",

author = "Ya{\~n}ez-Lim{\'o}n, {J. M.} and F. Ruiz and J. Gonz{\'a}lez-Hern{\'a}ndez and Chao, {B. S.} and Ovshinsky, {S. R.}",

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T1 - Low temperature crystallization of sputtered carbon films

AU - Yañez-Limón, J. M.

AU - Ruiz, F.

AU - González-Hernández, J.

AU - Chao, B. S.

AU - Ovshinsky, S. R.

PY - 1995

Y1 - 1995

N2 - The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides.

AB - The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides.

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U2 - 10.1063/1.360051

DO - 10.1063/1.360051

M3 - Artículo

SN - 0021-8979

VL - 78

SP - 3015

EP - 3019

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

ER -

Low temperature crystallization of sputtered carbon films

Abstract

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