Correlation between the photoluminescence and different types of Si nano-clusters in amorphous silicon

T. V. Torchynska, A. L. Quintos Vazquez, G. Polupan, Y. Matsumoto, L. Khomenkova, L. Shcherbyna

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

This paper presents the results of PL spectrum study for Si nano-clusters in amorphous silicon matrix. The hydrogenated amorphous Si layers were prepared by the hot-wire CVD method on glass substrates. The layers were deposited at different wafer temperatures 280, 360, 420 and 460 °C and at one filament temperature of 1650 °C. The joint analysis of PL and X-ray diffraction spectra in dependence on the technological conditions and on different sizes of Si nano-clusters has been done. The mechanisms of PL are discussed as well.

Original languageEnglish
Pages (from-to)2186-2189
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume354
Issue number19-25
DOIs
StatePublished - 1 May 2008

Keywords

  • Chemical vapor deposition
  • Luminescence
  • Nano-crystals
  • Optical spectroscopy
  • Silicon
  • X-ray diffraction

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