Atomic Layer Epitaxy by isothermal closed space sublimation

O. De Melo, E. Purón, M. Sánchez, E. Larramendi, L. C. Hernández, S. Tobeñas, M. Tamura, F. Cruz-Gandarilla, M. Hesiquio Garduño

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Abstract

Atomic Layer Epitaxy growth of optoelectronic semiconductors ZnTe, CdTe and CdxZn1-xTe and CdSe films is achieved by using a novel isothermal closed space sublimation system. The quality of the films and the Atomic Layer Epitaxy regime was confirmed by X-Rays and electron diffraction, Transmission Electron Microscope observations and composition measurement of the ternary CdxZn1-xTe alloys. The difference in vapor pressures between the elemental source and the growing surface is the driven force for the growth; this difference being zeroed once the surface is completely. ZnTe growth is regulated at 1 ML/cycle while CdTe is regulated at 0.5 ML/cycle.

Translated title of the contributionEpitaxia de capa atómica por sublimación isotérmica en espacio cerrado
Original languageEnglish
Pages (from-to)579-584
Number of pages6
JournalModern Physics Letters B
Volume15
Issue number17-19
DOIs
StatePublished - 20 Aug 2001

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