Engineering & Materials Science
Activation energy
5%
Aluminum oxide
6%
Ammonia
6%
Annealing
7%
Atomic force microscopy
7%
Buffer layers
21%
Chemical vapor deposition
10%
Coating techniques
5%
Crystallinity
5%
Crystallite size
6%
Epilayers
5%
Film growth
10%
Film thickness
13%
Fluxes
10%
Gallium
9%
Gallium arsenide
18%
Gallium nitride
52%
Hall effect
10%
Hydrogen
10%
Low pressure chemical vapor deposition
20%
Luminescence
6%
Magnesium
26%
Metallorganic chemical vapor deposition
100%
Metals
9%
Nitrogen
5%
Optical properties
34%
Organic chemicals
13%
Photoluminescence
57%
Sapphire
42%
Sol-gel process
5%
Sols
5%
Spin coating
6%
Structural properties
30%
Substrates
34%
Temperature
11%
Thermodynamics
10%
Thin films
11%
Vapor phase epitaxy
11%
X ray diffraction
11%
Chemistry
Annealing
8%
Atomic Force Microscopy
7%
Borate
11%
Buffer Solution
12%
Chemical Vapour Deposition
11%
Compound Mobility
9%
Dose
6%
Dosimetry
11%
Electrical Property
5%
Hall Effect
9%
Hexagonal Space Group
12%
Liquid Film
6%
Lithium Carbonate
5%
Luminiscence Type
9%
Magnesium Atom
10%
Nitride
12%
Nonequilibrium
13%
Optical Property
27%
Phonon
7%
Photoluminescence
19%
Photoluminescence Spectrum
12%
Polycrystalline Solid
11%
Pressure
20%
Radioluminescence
20%
Reaction Activation Energy
8%
Thermodynamics
7%
Thermoluminescence
11%
X-Ray Diffraction
8%
Physics & Astronomy
activation energy
9%
atomic force microscopy
5%
borates
10%
buffers
13%
charge carriers
5%
diffraction
5%
dosimeters
5%
electrical properties
11%
film thickness
10%
gallium nitrides
14%
hydrogen
5%
lithium
5%
low pressure
10%
luminescence
9%
magnesium
12%
metalorganic chemical vapor deposition
48%
metals
6%
optical properties
18%
photoluminescence
13%
radiation
6%
reactors
15%
sapphire
17%
temperature
7%
thermodynamics
8%
thermoluminescence
7%
thin films
8%
vapor phase epitaxy
13%