Engineering & Materials Science
Metallorganic chemical vapor deposition
100%
Photoluminescence
57%
Gallium nitride
52%
Sapphire
42%
Optical properties
34%
Substrates
34%
Structural properties
30%
Magnesium
26%
Buffer layers
21%
Low pressure chemical vapor deposition
20%
Gallium arsenide
18%
Organic chemicals
13%
Film thickness
13%
Thin films
11%
X ray diffraction
11%
Vapor phase epitaxy
11%
Temperature
11%
Thermodynamics
10%
Chemical vapor deposition
10%
Fluxes
10%
Hall effect
10%
Hydrogen
10%
Film growth
10%
Metals
9%
Gallium
9%
Annealing
7%
Atomic force microscopy
7%
Ammonia
6%
Spin coating
6%
Luminescence
6%
Crystallite size
6%
Aluminum oxide
6%
Nitrogen
5%
Sols
5%
Coating techniques
5%
Sol-gel process
5%
Epilayers
5%
Activation energy
5%
Crystallinity
5%
Chemistry
Optical Property
27%
Pressure
20%
Radioluminescence
20%
Photoluminescence
19%
Nonequilibrium
13%
Photoluminescence Spectrum
12%
Hexagonal Space Group
12%
Buffer Solution
12%
Nitride
12%
Borate
11%
Dosimetry
11%
Chemical Vapour Deposition
11%
Polycrystalline Solid
11%
Thermoluminescence
11%
Magnesium Atom
10%
Compound Mobility
9%
Hall Effect
9%
Luminiscence Type
9%
Reaction Activation Energy
8%
X-Ray Diffraction
8%
Annealing
8%
Thermodynamics
7%
Atomic Force Microscopy
7%
Phonon
7%
Dose
6%
Liquid Film
6%
Lithium Carbonate
5%
Electrical Property
5%
Physics & Astronomy
metalorganic chemical vapor deposition
48%
optical properties
18%
sapphire
17%
reactors
15%
gallium nitrides
14%
buffers
13%
photoluminescence
13%
vapor phase epitaxy
13%
magnesium
12%
electrical properties
11%
borates
10%
low pressure
10%
film thickness
10%
luminescence
9%
activation energy
9%
thermodynamics
8%
thin films
8%
temperature
7%
thermoluminescence
7%
radiation
6%
metals
6%
dosimeters
5%
atomic force microscopy
5%
lithium
5%
charge carriers
5%
hydrogen
5%
diffraction
5%