Xe⁺-irradiation effects on multilayer thin-film optical surfaces in EUV lithography

Ingeniería y ciencia de los materiales

• Multilayer films 100%
• Extreme ultraviolet lithography 97%
• Irradiation 67%
• Thin films 62%
• Laser produced plasmas 43%
• Plasmas 40%
• Ions 40%
• Plasma devices 39%
• X ray spectroscopy 37%
• Light reflection 35%
• Beam plasma interactions 34%
• Quartz crystal microbalances 34%
• Sputtering 28%
• Atomic force microscopy 27%
• Debris 23%
• Mirrors 22%
• Erosion 21%
• Multilayers 21%
• Impurities 21%
• Scattering 20%
• Degradation 15%
• Gases 12%
• Temperature 8%

Física y astronomía

• lithography 55%
• fluence 55%
• irradiation 42%
• thin films 33%
• plasma dynamics 21%
• ion scattering 19%
• quartz crystals 18%
• gas discharges 18%
• in situ measurement 18%
• debris 18%
• particle energy 17%
• laser plasmas 17%
• surface reactions 16%
• microbalances 16%
• surface temperature 16%
• accumulators 16%
• erosion 16%
• bombardment 15%
• sputtering 12%
• atomic force microscopy 12%
• degradation 12%
• mirrors 11%
• reflectance 11%
• life (durability) 11%
• impurities 10%
• spectroscopy 8%
• ions 7%
• x rays 7%
• performance 7%