TY - JOUR
T1 - Temperature dependence of the photoluminescence emission from In xGa1-x As quantum wells on GaAs(311) substrates
AU - Rojas-Ramírez, J. S.
AU - Goldhahn, R.
AU - Moser, P.
AU - Huerta-Ruelas, J.
AU - Hernández-Rosas, J.
AU - López-López, M.
PY - 2008
Y1 - 2008
N2 - We studied the photoluminescence (PL) properties of In0.2Ga 0.8As/GaAs quantum well structures grown by molecular beam epitaxy on (311)-oriented substrates. The structure consists of three quantum wells (QWs) of 100, 50, and 25 Å nominal thickness. The temperature dependence of the PL emission from the QWs in the range of 5-250 K is reported. Three models by Varshni, Via, and Pässler, respectively, were employed to analyze the variation in the excitonic energy transitions as a function of temperature. We compared the excitonic behavior with the band gap temperature dependence of bulk In0.2Ga0.8 As and found a difference, as opposed to the unstrained AlGaAs/GaAs system. We attributed this difference to the modification of the QW energy levels by the quantum confinement Stark effect, which is temperature and well width dependent.
AB - We studied the photoluminescence (PL) properties of In0.2Ga 0.8As/GaAs quantum well structures grown by molecular beam epitaxy on (311)-oriented substrates. The structure consists of three quantum wells (QWs) of 100, 50, and 25 Å nominal thickness. The temperature dependence of the PL emission from the QWs in the range of 5-250 K is reported. Three models by Varshni, Via, and Pässler, respectively, were employed to analyze the variation in the excitonic energy transitions as a function of temperature. We compared the excitonic behavior with the band gap temperature dependence of bulk In0.2Ga0.8 As and found a difference, as opposed to the unstrained AlGaAs/GaAs system. We attributed this difference to the modification of the QW energy levels by the quantum confinement Stark effect, which is temperature and well width dependent.
UR - http://www.scopus.com/inward/record.url?scp=58149240284&partnerID=8YFLogxK
U2 - 10.1063/1.3043578
DO - 10.1063/1.3043578
M3 - Artículo
SN - 0021-8979
VL - 104
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 12
M1 - 124304
ER -