TY - JOUR
T1 - Self-assembly of compositionally modulated Ga1-xMnxAs multilayers during molecular beam epitaxy
AU - Gallardo-Hernández, S.
AU - Martinez-Velis, I.
AU - Ramirez-Lopez, M.
AU - Kudriatsev, Y.
AU - Escobosa-Echavarria, A.
AU - Luiz Morelhao, S.
AU - Lopez-Lopez, M.
N1 - Funding Information:
This work was supported in part by ICyTDF and CONACYT-SENER project No. 151076. The authors would like to thank R. Fragoso and A. Tavira for their technical assistance.
PY - 2013/11/4
Y1 - 2013/11/4
N2 - GaMnAs structures were grown on GaAs(100) substrates by molecular beam epitaxy employing different growth parameters. We studied manganese incorporation employing secondary ion mass spectrometry (SIMS). At a growth temperature of 300°C, we observed a self-assembled modulation of the manganese concentration. SIMS depth profiles were analyzed employing a depth resolution function taking into account sputtering-induced broadening of the original distribution and segregation. We found a Mn segregation length along the growth direction of ∼4 nm. The presence of GaMnAs multilayers was corroborated by high-resolution x-ray diffraction. Spinodal decomposition is a possible mechanism for the spontaneous formation of the multilayer structure.
AB - GaMnAs structures were grown on GaAs(100) substrates by molecular beam epitaxy employing different growth parameters. We studied manganese incorporation employing secondary ion mass spectrometry (SIMS). At a growth temperature of 300°C, we observed a self-assembled modulation of the manganese concentration. SIMS depth profiles were analyzed employing a depth resolution function taking into account sputtering-induced broadening of the original distribution and segregation. We found a Mn segregation length along the growth direction of ∼4 nm. The presence of GaMnAs multilayers was corroborated by high-resolution x-ray diffraction. Spinodal decomposition is a possible mechanism for the spontaneous formation of the multilayer structure.
UR - http://www.scopus.com/inward/record.url?scp=84889770839&partnerID=8YFLogxK
U2 - 10.1063/1.4829922
DO - 10.1063/1.4829922
M3 - Artículo
SN - 0003-6951
VL - 103
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 19
M1 - 192113
ER -