TY - JOUR
T1 - Preparation of self-organized porous tungsten oxide using HFCVD technique
AU - Chávez, Fernando
AU - Felipe, Carlos
AU - Lima, Enrique
AU - Lara, Víctor
AU - Ángeles-Chávez, Carlos
AU - Hernandez, Miguel A.
PY - 2010/3/15
Y1 - 2010/3/15
N2 - Hot filament chemical vapour deposition (HFCVD) technique was applied to deposit a porous tungsten oxide film on glass wafers. The tungsten filament was used as a source in a vacuum atmosphere. The porous film was characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray thermodiffraction, nitrogen sorption and small-angle X-ray scattering. From these characterization techniques it was found that porous film presents a clusters-like morphology of WO3-x particles. The particles are arranged on substrate in a way that free spaces are originated, as a 3D network of pores. By increasing temperature, the BET specific surface area of the porous film changes from 38.67 to 34.5 m2 g-1 most likely due to the particles have a tendency to stick together to form aggregates, particularly at high temperature. A fractal geometry approach permits to elucidate the interconnection between the particles and a simple model of the porous structure is proposed.
AB - Hot filament chemical vapour deposition (HFCVD) technique was applied to deposit a porous tungsten oxide film on glass wafers. The tungsten filament was used as a source in a vacuum atmosphere. The porous film was characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray thermodiffraction, nitrogen sorption and small-angle X-ray scattering. From these characterization techniques it was found that porous film presents a clusters-like morphology of WO3-x particles. The particles are arranged on substrate in a way that free spaces are originated, as a 3D network of pores. By increasing temperature, the BET specific surface area of the porous film changes from 38.67 to 34.5 m2 g-1 most likely due to the particles have a tendency to stick together to form aggregates, particularly at high temperature. A fractal geometry approach permits to elucidate the interconnection between the particles and a simple model of the porous structure is proposed.
KW - Chemical vapour deposition
KW - Fractal dimension
KW - Porous media
KW - Tungsten oxide
UR - http://www.scopus.com/inward/record.url?scp=74349103041&partnerID=8YFLogxK
U2 - 10.1016/j.matchemphys.2009.10.017
DO - 10.1016/j.matchemphys.2009.10.017
M3 - Artículo
SN - 0254-0584
VL - 120
SP - 36
EP - 41
JO - Materials Chemistry and Physics
JF - Materials Chemistry and Physics
IS - 1
ER -