Photoluminescence response in carbon films deposited by pulsed laser deposition onto GaAs substrates at low vacuum

Ingeniería y ciencia de los materiales

• Photoluminescence 100%
• Carbon films 96%
• Pulsed laser deposition 95%
• Vacuum 54%
• Substrates 43%
• Photoluminescence spectroscopy 21%
• Q switched lasers 18%
• Laser induced breakdown spectroscopy 17%
• Luminescence 15%
• Neodymium lasers 13%
• Laser pulses 13%
• Atomic force microscopy 13%
• Ablation 12%
• Nanostructures 12%
• Optical microscopy 11%
• Film thickness 11%
• Graphite 10%
• X ray diffraction 10%
• Nitrogen 9%
• Wavelength 9%
• Oxygen 8%
• Carbon 7%

Química

• Pulsed Laser Deposition 81%
• Vacuum 49%
• Photoluminescence 47%
• Liquid Film 29%
• Carbon Atom 28%
• Laser Induced Breakdown Spectroscopy 9%
• Ablation 8%
• Photoluminescence Spectroscopy 8%
• Emission Peak 8%
• Optical Microscopy 6%
• Atomic Force Microscopy 6%
• Hexagonal Space Group 6%
• Graphite 5%
• Wavelength 5%
• Luminiscence Type 5%
• Nanomaterial 4%
• Nitrogen 4%
• X-Ray Diffraction 3%
• Dioxygen 3%