Photoacoustic thermal characterisation of porous silicon

Alfredo Cruz Orea, Isabel Delgadillo, Helion Vargas, Antonio Calderón, Juan J. Alvarado-Gil

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

Resumen

A nonseparation approach to determine the spark-processed porous silicon thermal parameters is presented. This thermal characterisation was performed through application of the photoacoustic technique, in combination with compositional models for spark-processed porous silicon samples. The thermal parameters obtained are in agreement with existing studies on the composition of this material. To illustrate this, an analogous method for the thermal characterisation of porous silicon formed by electrochemical etching is briefly outlined. This line of approach opens up the possibility of performing the thermal characterisation of other analogous materials.

Idioma originalInglés
Páginas (desde-hasta)561-566
Número de páginas6
PublicaciónHigh Temperatures - High Pressures
Volumen29
N.º5
DOI
EstadoPublicada - 1997
Publicado de forma externa

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