Light Emission in Nd Doped Si-Rich HfO₂ Films Prepared by Magnetron Sputtering

Ingeniería y ciencia de los materiales

• Photoluminescence 100%
• Light emission 95%
• Magnetron sputtering 82%
• Raman scattering 25%
• X rays 23%
• Phase separation 22%
• Microscopic examination 19%
• Diffraction 18%
• Annealing 17%
• Hafnium oxides 15%
• Scanning 13%
• Oxide films 10%
• Densification 10%
• Argon 9%
• Chemical properties 9%
• Spectroscopy 9%
• Structural properties 9%
• Atoms 9%
• Nitrogen 8%
• Plasmas 8%
• Ions 8%
• Infrared radiation 7%
• Defects 6%
• Temperature 3%

Física y astronomía

• light emission 57%
• magnetron sputtering 51%
• photoluminescence 43%
• x ray diffraction 15%
• electronics 13%
• Raman spectra 13%
• microscopy 12%
• hafnium oxides 12%
• scanning 11%
• annealing 10%
• argon plasma 10%
• chemical properties 9%
• pellets 8%
• x ray spectroscopy 8%
• densification 8%
• oxide films 7%
• radio frequencies 7%
• nitrogen 6%
• atmospheres 6%
• defects 4%
• atoms 4%
• excitation 4%
• ions 4%
• temperature 2%
• energy 2%

Química

• Magnetron Sputtering 71%
• Photoluminescence 35%
• Liquid Film 29%
• Phase Separation 13%
• Annealing 12%
• Diffraction Method 9%
• Hafnium Atom 9%
• Densification 8%
• Photoluminescence Spectrum 7%
• Pellet 7%
• Tetragonal Space Group 6%
• Luminiscence Type 5%
• Spectroscopy 4%
• Plasma 4%
• Nitrogen 4%
• Oxide 4%
• Purity 3%
• Energy 3%
• Ion 3%
• Surface 2%