TY - JOUR
T1 - Deposit of AlN thin films by nitrogen reactive pulsed laser ablation using an Al target
AU - Chale-Lara, F.
AU - Zapata-Torres, M.
AU - Caballero-Briones, F.
AU - De la Cruz, W.
AU - Cruz González, N.
AU - Huerta-Escamilla, C.
AU - Farías, M. H.
N1 - Publisher Copyright:
© 2019 Revista Mexicana de Física.
PY - 2019
Y1 - 2019
N2 - We report the synthesis of AlN hexagonal thin films by pulsed laser ablation, using Al target in nitrogen ambient over natively-oxidized Si (111) at 600°C. Composition and chemical state were determined by X-ray photoelectron spectroscopy, while structural properties were investigated using X-ray diffraction. High-resolution XPS spectra present a gradual shift to higher binding energies on the Al2p peak when nitrogen pressure is incremented, indicating the formation of the AlN compound. At 30 mTorr nitrogen pressure, the Al2p peak corresponds to AlN, located at 73.1 eV, and the XRD pattern shows a hexagonal phase of AlN. The successful formation of the AlN compound is corroborated by UV-Vis reflectivity measurements.
AB - We report the synthesis of AlN hexagonal thin films by pulsed laser ablation, using Al target in nitrogen ambient over natively-oxidized Si (111) at 600°C. Composition and chemical state were determined by X-ray photoelectron spectroscopy, while structural properties were investigated using X-ray diffraction. High-resolution XPS spectra present a gradual shift to higher binding energies on the Al2p peak when nitrogen pressure is incremented, indicating the formation of the AlN compound. At 30 mTorr nitrogen pressure, the Al2p peak corresponds to AlN, located at 73.1 eV, and the XRD pattern shows a hexagonal phase of AlN. The successful formation of the AlN compound is corroborated by UV-Vis reflectivity measurements.
KW - AlN thin films
KW - Pulsed laser deposition
KW - XPS
UR - http://www.scopus.com/inward/record.url?scp=85088873833&partnerID=8YFLogxK
U2 - 10.31349/REVMEXFIS.65.345
DO - 10.31349/REVMEXFIS.65.345
M3 - Artículo
AN - SCOPUS:85088873833
SN - 0035-001X
VL - 65
SP - 345
EP - 350
JO - Revista Mexicana de Fisica
JF - Revista Mexicana de Fisica
IS - 4
ER -