Calentador de sustratos compacto y de bajo costo para tratamiento térmico in situ de películas delgadas depositadas por rf-sputtering

The heater was constructed mainly of stainless steel, ceramic and a resistance of khantal-Al. The body of the heater is cooled using a system of fins and cooling liquid which is isolated completely of the vacuum chamber. The design of the heater also incorporates a rotation system that allows that the substrate turns during the process of growth providing uniformity to the film. Temperature of the substrate is recorded by a type "K"thermocouple which feeds back a temperature controller that provides a modulated voltage to the heating resistance. In order to evaluate the functionality of the heating system, this was mounted in a rf-sputtering equipment and thin films of BaTiO₃ were grown under different substrate temperatures in an off-axis geometry. The heating system is able to provide an uniform temperature to the substrate as well as to operate by long periods of times.