TY - JOUR
T1 - Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction
AU - Woo-García, Rosa M.
AU - Rodríguez-Ibarra, Isaac
AU - Osorio-De-la-rosa, Edith
AU - Guarneros-Aguilar, Cesia
AU - Caballero-Briones, Felipe
AU - Agustín-Serrano, Ricardo
AU - Herrera-May, Agustín L.
AU - López-Huerta, Francisco
N1 - Publisher Copyright:
© 2022 by the authors. Licensee MDPI, Basel, Switzerland.
PY - 2022/3
Y1 - 2022/3
N2 - The development and improvement of thin film deposition techniques is an important research topic to obtain new materials at submicro and nano scale with high homogeneity and thickness control. Here, we designed and built an automated device for the deposition of binary or ternary compound films using Successive Ionic Layer Adsorption and Reaction (SILAR). The instrument is integrated by three different systems. The first system consists of a mobile platform of two degrees of freedom. The second part has an 8-bit microcontroller used to adjust the velocities along the horizontal and vertical axes. The third, the control system, uses a mobile app that can be implemented in smart devices, developed in free code software for programming and monitoring the main deposition parameters of the SILAR device such as the number of cycles, the immersion and emersion velocities, the residence time at each step, and the number of reactors. The performance of our instrument was verified through the deposition of PbS films, varying the number of deposition cycles to study the variations in the film thickness and structure, and assessed by profilometry, Raman spectroscopy, X-ray diffraction and atomic force microscopy. The system demonstrated is useful to obtain crystalline films with controllable thicknesses.
AB - The development and improvement of thin film deposition techniques is an important research topic to obtain new materials at submicro and nano scale with high homogeneity and thickness control. Here, we designed and built an automated device for the deposition of binary or ternary compound films using Successive Ionic Layer Adsorption and Reaction (SILAR). The instrument is integrated by three different systems. The first system consists of a mobile platform of two degrees of freedom. The second part has an 8-bit microcontroller used to adjust the velocities along the horizontal and vertical axes. The third, the control system, uses a mobile app that can be implemented in smart devices, developed in free code software for programming and monitoring the main deposition parameters of the SILAR device such as the number of cycles, the immersion and emersion velocities, the residence time at each step, and the number of reactors. The performance of our instrument was verified through the deposition of PbS films, varying the number of deposition cycles to study the variations in the film thickness and structure, and assessed by profilometry, Raman spectroscopy, X-ray diffraction and atomic force microscopy. The system demonstrated is useful to obtain crystalline films with controllable thicknesses.
KW - Atomic force microscopy
KW - Automated mechanical system
KW - Deposition techniques
KW - PbS
KW - Raman spectroscopy
KW - SILAR
KW - Thin films
KW - X-ray diffraction
UR - http://www.scopus.com/inward/record.url?scp=85126542498&partnerID=8YFLogxK
U2 - 10.3390/pr10030492
DO - 10.3390/pr10030492
M3 - Artículo
AN - SCOPUS:85126542498
SN - 2227-9717
VL - 10
JO - Processes
JF - Processes
IS - 3
M1 - 492
ER -