Visible and infrared photocatalytic activity of TiOx thin films prepared by reactive sputtering

M. Zapata-Torres, E. Hernández-Rodríguez, R. Mis-Fernandez, M. Meléndez-Lira, O. Calzadilla Amaya, D. Bahena, V. Rejon, J. L. Peña

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

TiOx thin films have been deposited on corning glass substrates, using RF magnetron reactive sputtering from a Ti target. The effect of oxygen mass flow (OMF) used during the growth of the films on their physical and photocatalytic properties was investigated. The properties of the samples were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and UV-vis spectroscopy. The films presented a stratified structure with the surface layer having the stoichiometric characteristics of TiO2 while the inner layer contained a mixture of TiO2, Ti2O3 and TiO oxides. The photocatalytic efficiency was evaluated by the photodegradation of a methylene blue aqueous solution. The samples showed a photocatalytic activity in the visible and visible-NIR light spectrum, depending on the phases of titanium oxides present in the film.

Original languageEnglish
Pages (from-to)720-726
Number of pages7
JournalMaterials Science in Semiconductor Processing
Volume40
DOIs
StatePublished - 1 Aug 2015
Externally publishedYes

Keywords

  • NIR photocathalitic activity
  • Red-shift band gap
  • TiO

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