Ultrafast third-order nonlinear ultraviolet response exhibited by ion-implanted silicon nanoparticles in silica

C. Torres-Torres, J. Bornacelli, J. C. Cheang-Wong, L. Rodríguez-Fernández, A. Oliver

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Described herein is the evaluation of the nonlinear ultraviolet transmittance exhibited by Silicon nanoparticles nucleated in a high-purity silica matrix. A saturated absorption was identified as the main physical mechanism responsible for the nonlinear ultraviolet absorption in a nanosecond regime. A single-beam transmittance experiment was carried out with pulses provided by the third harmonic of a Nd:YAG laser system. A two-level model led us to estimate the ultrafast optical response of the nanoparticles. It is highlighted the potential of the sample to control nanophotonic signals.

Original languageEnglish
Title of host publication2017 Photonics North, PN 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538621929
DOIs
StatePublished - 30 Oct 2017
Event2017 Photonics North, PN 2017 - Ottawa, Canada
Duration: 6 Jun 20178 Jun 2017

Publication series

Name2017 Photonics North, PN 2017

Conference

Conference2017 Photonics North, PN 2017
Country/TerritoryCanada
CityOttawa
Period6/06/178/06/17

Keywords

  • Nonlinear optics
  • ion-implantation
  • nanoparticles

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