TY - GEN
T1 - Tungsten nanostructured thin films obtained via HFCVD
AU - Goiz, O.
AU - Chávez, F.
AU - Zaca-Morán, P.
AU - Ortega-Mendoza, J. G.
AU - Pérez-Sánchez, G. F.
AU - Morales, N.
AU - Felipe, C.
AU - Peña-Sierra, R.
PY - 2011
Y1 - 2011
N2 - By using the Hot Filament Chemical Vapor Deposition (HFCVD) technique tungsten thin films were deposited on amorphous quartz substrates. To achieve this, a tungsten filament was heated at 1300 °C during 30 minutes maintaining a constant pressure inside the chamber at 460 mTorr and substrate at 700 °C. Transition from tungsten oxide deposits to tungsten thin films, by varying the substrate temperature, were characterized by means of Scanning Electron Microscope (SEM), Atomic Force Microscope (AFM), X-Ray Diffraction and, micro-Raman spectroscopy. The SEM micrographs reveal that the tungsten films have no more than 200 nm in thickness while XRD show evidence of the films crystallize in the á-tungsten modification. On the other hand, AFM shows that the tungsten thin films exhibit a uniform and smooth surface composed with semi-spherical shapes whose diameters are below than 50 nm. Furthermore, to the naked eye, the as-deposited tungsten films exhibit a high mirror-like appearance.
AB - By using the Hot Filament Chemical Vapor Deposition (HFCVD) technique tungsten thin films were deposited on amorphous quartz substrates. To achieve this, a tungsten filament was heated at 1300 °C during 30 minutes maintaining a constant pressure inside the chamber at 460 mTorr and substrate at 700 °C. Transition from tungsten oxide deposits to tungsten thin films, by varying the substrate temperature, were characterized by means of Scanning Electron Microscope (SEM), Atomic Force Microscope (AFM), X-Ray Diffraction and, micro-Raman spectroscopy. The SEM micrographs reveal that the tungsten films have no more than 200 nm in thickness while XRD show evidence of the films crystallize in the á-tungsten modification. On the other hand, AFM shows that the tungsten thin films exhibit a uniform and smooth surface composed with semi-spherical shapes whose diameters are below than 50 nm. Furthermore, to the naked eye, the as-deposited tungsten films exhibit a high mirror-like appearance.
KW - HFCVD
KW - tungsten oxide films
KW - tungsten thin films
UR - http://www.scopus.com/inward/record.url?scp=80053994939&partnerID=8YFLogxK
U2 - 10.1117/12.893850
DO - 10.1117/12.893850
M3 - Contribución a la conferencia
AN - SCOPUS:80053994939
SN - 9780819487148
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Nanostructured Thin Films IV
T2 - Nanostructured Thin Films IV
Y2 - 23 August 2011 through 25 August 2011
ER -