Abstract
A new method has been devised for the deposition of TiO2 thin films on conducting glass using a microwave reactor. The substrates are immersed in a diluted homogeneous aqueous solution which was prepared by mixing equal volumes of a fluorine-complexed titanium(IV) solution ([Ti] = 3.4×10-2M) and 6.8×10-2 M boric acid solution. Low microwave power and short deposition time have been used. The TiO2 layers obtained are well-adhered, homogenous, with good specularity and colored by interference of reflected light. Their thickness is in the range of 100-500 nm. SEM experiments denote that films are formed by small crystallites having linear dimensions under 100 nm. Crystal dimensions depend on microwave power and deposition time. The layers show a high degree of crystallinity and the observed crystal phase is anatase. Microwave heating has proved to be an efficient and inexpensive method for solution growth of TiO2 films; it should also be of importance for other materials layers grown from solution.
Original language | English |
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Pages (from-to) | 12-18 |
Number of pages | 7 |
Journal | Thin Solid Films |
Volume | 365 |
Issue number | 1 |
DOIs | |
State | Published - 3 Apr 2000 |
Externally published | Yes |