Synthesis of visible light emitting self assembled Ge nanocrystals embedded within a SiO ₂ matrix

As-grown light emitting self-assembled Ge nanocrystals (Ge-NCs) embedded in a SiO ₂ matrix were produced via a sequential deposition process of SiO ₂/Ge/SiO ₂ layers employing a reactive radio frequency sputtering technique. Obtained Ge-NCs show a crystallographic phase, the proportion, size, quality, and specific orientation of which are determined by the oxygen partial pressure. Photoluminescence (PL) spectra indicate that the size distribution of Ge-NCs is reduced and centered on about 8 nm when higher oxygen partial pressure is employed; the formation of Ge-NCs is corroborated by transmission electron microscopy measurements, and their sizes are consistent with estimates from PL measurements. Resistivity measurements are explained by a near neighbors hopping process, with specific features depending on the Ge-NCs' size. The features of PL and resistivity measurements indicate that there is no appreciable dependence of the number of interfacial defects on the oxygen partial pressure.