Synthesis of transparent ZrO 2 thin films by MOCVD

P. Cárcamo León; A. M. Torres-Huerta; M. A. Domínguez-Crespo; E. Ramírez-Meneses

doi:10.1149/1.3207628

Synthesis of transparent ZrO ₂ thin films by MOCVD

P. Cárcamo León, A. M. Torres-Huerta, M. A. Domínguez-Crespo, E. Ramírez-Meneses

Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada (CICATA), Unidad Altamira

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

4 Scopus citations

Abstract

ZrO ₂ films on glass and quartz substrates were synthesized by metalorganic chemical vapour deposition (MOCVD) using zirconium acetylacetonate (Zr(acac) ₄) as precursor. The reactive and carrier gases were oxygen and argon, respectively. Structural and morphological characterizations were studied by XRD, SEM and AFM. Naked-eye transparent films of cubic ZrO ₂ phase were obtained, with crystallite size ranging from 10 - 17 nm. Apparently, the films grow in a columnar structure and there is not contamination by carbon atoms. The film mean roughness is low, ranging from 0.674 to 1.33 nm. The films are forming of particles which sizes are ranging from 0.2 to 1.0 μm for the films grown at 700 °C and from 0.1 to 0.5 μm for the films grown at 500 °C.

Original language	English
Title of host publication	ECS Transactions - EuroCVD 17/CVD 17
Pages	475-482
Number of pages	8
Edition	8 PART 1
DOIs	https://doi.org/10.1149/1.3207628
State	Published - 2009
Event	17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society - Vienna, Austria Duration: 4 Oct 2009 → 9 Oct 2009

Publication series

Name	ECS Transactions
Number	8 PART 1
Volume	25
ISSN (Print)	1938-5862
ISSN (Electronic)	1938-6737

Conference

Conference	17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society
Country/Territory	Austria
City	Vienna
Period	4/10/09 → 9/10/09

Access to Document

10.1149/1.3207628

Cite this

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title = "Synthesis of transparent ZrO 2 thin films by MOCVD",

abstract = "ZrO 2 films on glass and quartz substrates were synthesized by metalorganic chemical vapour deposition (MOCVD) using zirconium acetylacetonate (Zr(acac) 4) as precursor. The reactive and carrier gases were oxygen and argon, respectively. Structural and morphological characterizations were studied by XRD, SEM and AFM. Naked-eye transparent films of cubic ZrO 2 phase were obtained, with crystallite size ranging from 10 - 17 nm. Apparently, the films grow in a columnar structure and there is not contamination by carbon atoms. The film mean roughness is low, ranging from 0.674 to 1.33 nm. The films are forming of particles which sizes are ranging from 0.2 to 1.0 μm for the films grown at 700 °C and from 0.1 to 0.5 μm for the films grown at 500 °C.",

author = "Le{\'o}n, {P. C{\'a}rcamo} and Torres-Huerta, {A. M.} and Dom{\'i}nguez-Crespo, {M. A.} and E. Ram{\'i}rez-Meneses",

year = "2009",

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booktitle = "ECS Transactions - EuroCVD 17/CVD 17",

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León, PC, Torres-Huerta, AM , Domínguez-Crespo, MA & Ramírez-Meneses, E 2009, Synthesis of transparent ZrO ₂ thin films by MOCVD. in ECS Transactions - EuroCVD 17/CVD 17. 8 PART 1 edn, ECS Transactions, no. 8 PART 1, vol. 25, pp. 475-482, 17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society, Vienna, Austria, 4/10/09. https://doi.org/10.1149/1.3207628

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AU - León, P. Cárcamo

AU - Torres-Huerta, A. M.

AU - Domínguez-Crespo, M. A.

AU - Ramírez-Meneses, E.

PY - 2009

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N2 - ZrO 2 films on glass and quartz substrates were synthesized by metalorganic chemical vapour deposition (MOCVD) using zirconium acetylacetonate (Zr(acac) 4) as precursor. The reactive and carrier gases were oxygen and argon, respectively. Structural and morphological characterizations were studied by XRD, SEM and AFM. Naked-eye transparent films of cubic ZrO 2 phase were obtained, with crystallite size ranging from 10 - 17 nm. Apparently, the films grow in a columnar structure and there is not contamination by carbon atoms. The film mean roughness is low, ranging from 0.674 to 1.33 nm. The films are forming of particles which sizes are ranging from 0.2 to 1.0 μm for the films grown at 700 °C and from 0.1 to 0.5 μm for the films grown at 500 °C.

AB - ZrO 2 films on glass and quartz substrates were synthesized by metalorganic chemical vapour deposition (MOCVD) using zirconium acetylacetonate (Zr(acac) 4) as precursor. The reactive and carrier gases were oxygen and argon, respectively. Structural and morphological characterizations were studied by XRD, SEM and AFM. Naked-eye transparent films of cubic ZrO 2 phase were obtained, with crystallite size ranging from 10 - 17 nm. Apparently, the films grow in a columnar structure and there is not contamination by carbon atoms. The film mean roughness is low, ranging from 0.674 to 1.33 nm. The films are forming of particles which sizes are ranging from 0.2 to 1.0 μm for the films grown at 700 °C and from 0.1 to 0.5 μm for the films grown at 500 °C.

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