Structural analysis of TiO₂ films grown using microwave-activated chemical bath deposition

TiO₂ layer films were grown using the microwave (MW)-activated chemical bath deposition technique on two different indium tin oxide substrates. The TiO₂ films are studied to determine their structural response when changing the MW heating power. Thickness (areal density), oxygen concentration profile, composition and surface homogeneity were determined using Rutherford backscattering spectrometry, nuclear reaction analysis and atomic force microscopy. The analysis showed that the composition, thickness and surface structure of the films are highly influenced by MW heating power. The substrate, acting as seed for nucleation, influences the layer thickness, indicating that a thinner layer of TiO₂ is obtained for the more conducting substrates. The oxygen concentration profile is constant in the TiO₂ layer at low MW heating, power (≈20%). The rugosity of the samples and the non-homogeneity increase with the MW heating power. If the MW heating power is high enough pinholes in the TiO₂ layer of the order of the sample thickness are produced.