TY - GEN
T1 - Raman characterization of the In0.14Ga0.86As 0.13Sb0.87 highly doped with Te grown on GaSb by liquid phase epitaxy
AU - Díaz-Reyes, J.
AU - López-Cruz, E.
AU - Mendoza-Álvarez, J. G.
AU - Jiménez-Sandoval, S.
PY - 2006/3
Y1 - 2006/3
N2 - Using the liquid phase epitaxy technique under supercooling conditions we have grown In0.14Ga0.86As0.13Sb0.87 layers doped with tellurium lattice-matched to (100) n-GaSb substrates. Layers doped with tellurium were accomplished by incorporation of Sb2Te 3 pellets into the growth melt in different concentrations, in the range of 6.48 × 10-6 to 4.31 × 10-4 molar fraction. Using Raman scattering we characterized the structural quality. The Raman spectra show two main peaks located about 150 and 265 cm-1, which were deconvoluted by four Lorentzians. In order to assign the peaks use is made of the random-element isodisplacement (REI) model. Comparison of the experimental results with the values obtained by REI model allows us to confirm that the bands correspond to the LO-like and TO-like of the binary compounds, GaAs and (GaSb+InAs).
AB - Using the liquid phase epitaxy technique under supercooling conditions we have grown In0.14Ga0.86As0.13Sb0.87 layers doped with tellurium lattice-matched to (100) n-GaSb substrates. Layers doped with tellurium were accomplished by incorporation of Sb2Te 3 pellets into the growth melt in different concentrations, in the range of 6.48 × 10-6 to 4.31 × 10-4 molar fraction. Using Raman scattering we characterized the structural quality. The Raman spectra show two main peaks located about 150 and 265 cm-1, which were deconvoluted by four Lorentzians. In order to assign the peaks use is made of the random-element isodisplacement (REI) model. Comparison of the experimental results with the values obtained by REI model allows us to confirm that the bands correspond to the LO-like and TO-like of the binary compounds, GaAs and (GaSb+InAs).
UR - http://www.scopus.com/inward/record.url?scp=33744927667&partnerID=8YFLogxK
U2 - 10.1051/jp4:2006132040
DO - 10.1051/jp4:2006132040
M3 - Contribución a la conferencia
AN - SCOPUS:33744927667
SN - 2868839185
SN - 9782868839183
T3 - Journal De Physique. IV : JP
SP - 211
EP - 214
BT - Proceedings - ICFSI-10 - 10th International Conference on the Formation of Semiconductor Interfaces
T2 - ICFSI-10 - 10th International Conference on the Formation of Semiconductor Interfaces
Y2 - 3 July 2005 through 8 July 2005
ER -