Raman characterization of the In0.14Ga0.86As 0.13Sb0.87 highly doped with Te grown on GaSb by liquid phase epitaxy

J. Díaz-Reyes, E. López-Cruz, J. G. Mendoza-Álvarez, S. Jiménez-Sandoval

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Using the liquid phase epitaxy technique under supercooling conditions we have grown In0.14Ga0.86As0.13Sb0.87 layers doped with tellurium lattice-matched to (100) n-GaSb substrates. Layers doped with tellurium were accomplished by incorporation of Sb2Te 3 pellets into the growth melt in different concentrations, in the range of 6.48 × 10-6 to 4.31 × 10-4 molar fraction. Using Raman scattering we characterized the structural quality. The Raman spectra show two main peaks located about 150 and 265 cm-1, which were deconvoluted by four Lorentzians. In order to assign the peaks use is made of the random-element isodisplacement (REI) model. Comparison of the experimental results with the values obtained by REI model allows us to confirm that the bands correspond to the LO-like and TO-like of the binary compounds, GaAs and (GaSb+InAs).

Original languageEnglish
Title of host publicationProceedings - ICFSI-10 - 10th International Conference on the Formation of Semiconductor Interfaces
Pages211-214
Number of pages4
DOIs
StatePublished - Mar 2006
EventICFSI-10 - 10th International Conference on the Formation of Semiconductor Interfaces - Aix-en-Provence, France
Duration: 3 Jul 20058 Jul 2005

Publication series

NameJournal De Physique. IV : JP
Volume132
ISSN (Print)1155-4339
ISSN (Electronic)1764-7177

Conference

ConferenceICFSI-10 - 10th International Conference on the Formation of Semiconductor Interfaces
Country/TerritoryFrance
CityAix-en-Provence
Period3/07/058/07/05

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